Mask-less Laser Lithography
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Offering type ?
PRODUCT:
Component or system, which is commercialized. It is available for ordering multiple pieces and liability is assumed by the provider/seller. Necessary certification of the product was obtained (e.g. CE certification). The product sheet and/or conditions of use are defined.
PROTOTYPE:
Component or system, which has been successfully tested under real or real-like conditions. The prototype is not commercialized as the main purpose is to use it for demonstration and experimentation, including user and market acceptance.
TECHNICAL SERVICE:
Tools and processes and its combination, which are necessary to prepare and test prototypes or products.
- Service
- Product | Prototype
- Product | Tools
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Market
- Lighting
- Optical instrumentation
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Manufacturing Pillar
- Roll-2-Roll
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Technology
- Laser Lithography - Maskless
JOANNEUM RESEARCH offers mask-less laser lithography for cost-effective, high-resolution sub-micro and microstructure fabrication. This digital process supports rapid prototyping and master fabrication for optics, microfluidics, and electronics, enabling flexible designs on flat and curved substrates with precision up to 200 nm.
Offering Description
Origination by mask-less Laser Lithography
Our unique mask-less laser lithography enables the low-cost production
of novel and complex high-resolution sub-micro and micro-structures:
- Master fabrication e.g. for UV-nanoimprint lithography, hot-embossing, high precision optical injection moulding, vacuum resin casting
- a Rapid prototyping in Micro-Optics, Photonics, Microfluidics, Electronics and others
Several advantages can be realised:
- Reduction of process time
- digital, non-photomask-based production
- quick and flexible to test and implement design changes
- fabrication of microstructures on flat and curved substrates via 5-axes nano-positioning system
Applications can be found in
- Free form micro optics for innovative illumination designs
- Diffractive and refractive micro optical elements
- Bionic surfaces in aviation for reduction of drag to reduce fuel consumption
- Microfluidic Lab-on-Chip systems for molecular diagnostics
- Micro-Electronics
Offering Specifications
- High quality fabrication of sub-micro and micro-structures on large area formats (2″, 4″, possibly 6″ substrate)
- Structures can have a 1D, 2D, or stepless (2.5 D) relief shape
- Minimum structure size achieved in the lateral direction of our system is in the range of 200 nm
- Maximum structure depth for 2.5D microstructures is in the range of 60 μm
- Aspect ratio of 4 is possible
- Depending on the complexity of the designed microstructure, the processing time is approx. 1 hour per cm2
