Flexible Modular Nanoimprint Equipment

  • Offering type
    ?
    PRODUCT:

    Component or system, which is commercialized. It is available for ordering multiple pieces and liability is assumed by the provider/seller. Necessary certification of the product was obtained (e.g. CE certification). The product sheet and/or conditions of use are defined.

    PROTOTYPE:

    Component or system, which has been successfully tested under real or real-like conditions. The prototype is not commercialized as the main purpose is to use it for demonstration and experimentation, including user and market acceptance.

    TECHNICAL SERVICE:

    Tools and processes and its combination, which are necessary to prepare and test prototypes or products.

    • Pilot production
    • Prototyping
  • Market
    • AR/VR/MR
    • Consumer Products
    • Imagers & Displays
  • Manufacturing Pillar
    • Roll-2-Plate
  • Technology
    • UV-NIL replication
Preferred Supplier
We offer a fully automated Roll-to-Plate (R2P) nanoimprint platform for high-volume manufacturing of large-area optical structures. It integrates priming, coating, imprinting, and curing into one industrial system, delivering sub-40 nm precision, high throughput, and excellent uniformity on panels up to 1.3 m². Aurora enables cost-efficient mass production of advanced display optics, enhancing the next generation of TV, monitor, and device screens.

Offering Description

Portis is an adaptable nanoimprint platform designed as a bridge from prototyping to scalable industrial production. This system is ideal to explore new materials, develop processes, or produce smaller-volume batches. Its modular design means each line can be tailored with only the required functions, making it cost-efficient for early-stage development or specialty manufacturing.
Portis maintains excellent uniformity, repeatability, and pattern fidelity, enabling accurate replication across a wide range of optical textures. It supports rigid and flexible substrates, including glass, polymers, and metals, and is available in 600 mm and 1100 mm width configurations.

Offering Specifications

  • Substrate sizes:
    • Portis NIL 600: width up to 600 mm
    • Portis NIL 1100: width up to 1100 mm
  • Substrate thickness: 0.5 – 10 mm
  • Materials: glass, polymer, metal
  • Textures: 50 nm – 500 µm
  • Modules: primer, coater, imprint (configurable)
  • Applications: R&D, prototyping, pilot production, specialty optics

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Flexible Modular Nanoimprint Equipment

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