Fully Automated Large-Area Nanoimprint Production Equipment

  • Offering type
    ?
    PRODUCT:

    Component or system, which is commercialized. It is available for ordering multiple pieces and liability is assumed by the provider/seller. Necessary certification of the product was obtained (e.g. CE certification). The product sheet and/or conditions of use are defined.

    PROTOTYPE:

    Component or system, which has been successfully tested under real or real-like conditions. The prototype is not commercialized as the main purpose is to use it for demonstration and experimentation, including user and market acceptance.

    TECHNICAL SERVICE:

    Tools and processes and its combination, which are necessary to prepare and test prototypes or products.

    • Volume production
    • Pilot production
  • Market
    • Imagers & Displays
  • Manufacturing Pillar
    • Roll-2-Plate
  • Technology
    • UV-NIL replication
Preferred Supplier
We offer fully automated Roll-to-Plate (R2P) nanoimprint production equipment for high-volume manufacturing of large-area optical structures for advanced display optics, enhancing the next generation of TV, monitor, and device screens. It integrates priming, coating, imprinting, and curing into one industrial system, delivering sub-40 nm precision, high throughput, and excellent uniformity on panels up to 1.3 m².

Offering Description

Aurora supports mass manufacturing of surface textures used in advanced displays, light-management layers, optical films, and functional coatings. With extremely high pattern fidelity, Aurora ensures precise replication of structures down to the tens-of-nanometer range while maintaining excellent throughput and process stability.

Aurora is engineered for continuous, industrial-scale production of nano- and microstructures on large rigid substrates. The system includes fully automated substrate handling, inline process control, and integrated curing, allowing reliable 24/7 operation.

Offering Specifications

  • Process modules: primer, coater, nanoimprint, curing, automated handling
  • Substrate size: up to Gen5 (1100 x 1300 mm²)
  • Substrate thickness: 0.5 – 10 mm
  • Substrate naterials: tigid & flexible (glass, polymer, metal)
  • Structure: from 50 nm to 500 µm
  • Applications: advanced displays, optical films, light-management layers, functional micro/nanotextures

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Fully Automated Large-Area Nanoimprint Production Equipment

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