Nanoimprint (replication of nano/micron textures)

  • Offering type
    ?
    PRODUCT:

    Component or system, which is commercialized. It is available for ordering multiple pieces and liability is assumed by the provider/seller. Necessary certification of the product was obtained (e.g. CE certification). The product sheet and/or conditions of use are defined.

    PROTOTYPE:

    Component or system, which has been successfully tested under real or real-like conditions. The prototype is not commercialized as the main purpose is to use it for demonstration and experimentation, including user and market acceptance.

    TECHNICAL SERVICE:

    Tools and processes and its combination, which are necessary to prepare and test prototypes or products.

    • Equipment
  • Market
    • AR/VR
    • Automotive
    • Imagers & Displays
    • Lighting
    • Optical instrumentation
    • Solar, Energy & Daylight
    • Transportation
  • Manufacturing Pillar
    • Roll-2-Plate
  • Technology
    • UV-NIL replication
Member

Morphotonics B.V. offers UV-Nanoimprint Lithography (UV-NIL) replication for large substrates (up to 1.1m). This cost-effective technology enables mass production of precise micro/nanostructures for applications in displays, lighting, sensors, and solar panels, with textures ranging from 50 nm to 500 µm.

Offering Description

Morphotonics is a nanoimprint lithography equipment and consumables supplier for various photonics (light management) applications. Through our unique roll-to-plate (R2P) nanoimprint technology, micro- and nanostructures can be applied on very large substrates  of over 1 x 1 meter. With multiple smaller products tiled together, replicated on on large substrates, optical textures can be added in cost-effectively with high throughput. This opens up the mass production of innovative precise optics in displays, smartphones, tablets, sensors, lighting products and solar panels.

Offering Specifications

• Substrate sizes:
        o Width of max 600mm for Portis NIL 600
        o Width of max 1100mm for Portis NIL 1100
• Substrate thickness: 0.5 – 10 mm
• Substrate materials: Glass, polymer, metal
• Textures: from 50 nanometer up to 500 micrometer

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Nanoimprint (replication of nano/micron textures)

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