VTT Technical Research Centre of Finland Ltd offers an R2R pilot converting line for foil processing. It supports lamination up to 300mm wide, CO2 laser or mechanical die-cut openings, and device die-cutting from foil, enabling versatile and precise manufacturing for imaging, lighting, and security applications.
VTT Technical Research Centre of Finland Ltd provides an R2R assembly pilot line for assembling SMD components on flexible foil circuits. Featuring integrated dispensing, assembly, and curing processes, it enables efficient stop-and-go or S2S operations for low-cost, flexible electronics production.
The Desktop R2P NanoImprinter is suitable for small-scale nanoimprint lithography work. This device is ideal for fast prototyping, testing, and characterisation of the property of a topology, photo-curable resins and imprinting materials.
Micro- and nano structuring services for molds made of steel and other materials, enabling surface functions such as Anti Reflective, Anti Glare, Superhydrophobicity or even meta surfaces.
Nanocomp Oy Ltd offers Roll-to-Roll (R2R) UV imprint replication for high-resolution, cost-effective mass production of optical components. This process uses UV curable resin to replicate micro and nano-structures on flexible substrates, ideal for light guides, diffractive optical elements, and microlens arrays.
Nanocomp Oy Ltd offers high-precision grayscale direct write laser lithography for nano- and microstructures. This advanced technology enables binary and continuous profiles with structures up to 45 cm² in area, providing accurate tooling for applications in automotive, electronics, lighting, and more.
Nanocomp Oy Ltd manufactures customizable microlens array (MLA) films using UV roll-to-roll imprinting, offering high precision and cost-efficient mass production. These ultra-thin, flexible films are ideal for applications in displays, sensors, fiber couplers, and 3D imaging, providing excellent optical performance and customizable shapes.
Nanocomp Oy Ltd offers ultra-thin Fresnel lens films using UV embossing and customizable lens shapes. These films provide excellent optical performance with minimal fringe visibility, ideal for applications like LED light shaping, sensor optics, and laser beam shaping, with customizable focal lengths and profiles.
Morphotonics B.V. offers UV-Nanoimprint Lithography (UV-NIL) replication for large substrates (up to 1.1m). This cost-effective technology enables mass production of precise micro/nanostructures for applications in displays, lighting, sensors, and solar panels, with textures ranging from 50 nm to 500 µm.
We specialize in femtosecond laser and nanosecond laser services: laser microstructuring, laser texturing (functional and design) and industrial engraving for moulds, tools and pieces over 3D or flat surfaces. We work both for production project and for R&D for all kind of markets.
LASEA specializes in precision micro machining using ultra-short femtosecond laser technology. The company offers services including laser marking, engraving, cutting, welding, and texturing, with applications across industries such as automotive, healthcare, and luxury goods. Key benefits include flexibility, versatility (processing various materials like glass, metal, and polymers), high accuracy (resolutions from 0.5 to 20 µm), and non-contact processes with reproducible results. The processing area ranges from a few millimeters up to 1 meter.
JOANNEUM RESEARCH offers Step and Repeat nanoimprint lithography for large-scale production of flexible shims and prototypes. Using a modified EVG770 NIL stepper, this process enables high-precision, cost-effective production for photonics, functional surfaces, and microfluidic systems, with a substrate size of up to 270x700mm.
We offer a novel print head for direct micro additive fabrication of multi-material micro-optics using 2-photon polymerization. This enables fast prototyping and medium volume production of precisely aligned, compacted composite systems like lens stacks of different refractive index materials.
Nearly all products in the field of automotive lighting are subject to the trends of reducing installation space, improving efficiency and design flexibility. The use of novel free-form micro-optics, which promise a great benefit concerning these trends, is especial conceivable for headlamp systems.
Customized micro Fresnel lenslets may support your illumination application. Fraunhofer IOF generates Fresnel lenslets by grayscale photolithography with quasi continuous surface profile. We offer Fresnel lenslets in fused silica, Si, or Ge for applications from UV to MIR or as polymer on glass
Industrial scale contract manufacturing partner for R2R UV-imprinting of foil materials in roll widths of up to 1600 mm (also small volumes in smaller widths possible). Full service provider incl. sourcing of raw materials, manufacturing, converting, packaging, etc.
We are a market leader and premium partner when it comes to optical grade polymers – manufactured on wafer-level. Micro-optics and nanostructures are key technologies for the latest miniaturized optoelectronic components in smartphones, smart glasses and vehicles.
We provide vacuum web coating plants for coating of flexible materials with optical, electrical and decorative functional layers and barrier layers via sputtering techniques and magnetron PECVD processes. Line speed of up to 100 meters per minute can be achieved.
We provide feasibility studies, samples for tests, pilot production, technology and licences transfer and modification on existing coating plants.
Fraunhofer FEP offers advanced material characterization services, including surface, optical, and mechanical testing, as well as material stability assessments. Techniques include SEM, AFM, WLI, spectrometry, and more, supporting diverse applications in AR/VR, optics, healthcare, automotive, and beyond.
We develop coatings and layer systems on flat substrates using sputtering technologies. Our special expertise is in the field of pulse magnetron sputtering (PMS) and the control of reactive sputter processes and their optimization for application-relevant requirements.
CSEM SA offers Step & Repeat UV-imprint Lithography for scaling nano- and microstructures from small masters to large substrates (up to 350x600mm, 0.1–10mm thick). This high-precision (<5 µm) process supports tooling for R2P and R2R mass production in AR/VR, optics, healthcare, and other industries.
CSEM SA provides electroforming for wafer-scale and large-area Ni shims (up to 350x550mm, 0.1–50mm thick). This process creates precise masters and second-generation copies for scaling and replication (e.g., R2P, R2R UV imprint), supporting applications in AR/VR, healthcare, optics, and more.
CSEM SA offers Roll-to-Plate (R2P) UV-NIL replication, enabling precise micro- and nanostructures on large substrates (up to 600x1200mm, 0.5–10mm thick) for cost-effective mass production. Applications span AR/VR, healthcare, optics, solar, and more, ensuring high throughput and innovative photonics solutions.
CSEM SA offers wafer-scale UV-NIL replication services for microlenses, arrays, and freeform micro-optical elements. Supporting AR/VR, automotive, and healthcare, they ensure alignment precision below 2 microns, handle materials like glass and polymers, and produce up to 100 wafers/year on 6-inch wafers.
CSEM SA offers wafer-scale technical services for originating micro-lens arrays via photolithography and thermal reflow. Applications span AR/VR, automotive, healthcare, consumer electronics, and more, with customizable shapes, sizes, and array patterns for diverse markets.
CSEM SA designs and manufactures micro-lenses and arrays for AR/VR, automotive, and healthcare. They offer prototyping, UV-NIL replication, thermal reflow, and wafer-scale UV imprinting up to 6 inches. Services include metrology, integration, and packaging to scale production.
CSEM SA provides Characterization & Quality Control services for AR/VR, automotive, and healthcare. They offer surface profiling (AFM, SEM, 3D profilometry), optical analysis, and material stability testing, enabling precise surface measurements up to 60×60 cm² tailored to client needs.
CSEM SA offers optical simulation and design services for industries like AR/VR, automotive, and healthcare. Using tools like Zemax and MATLAB, they optimize light interactions, develop optical components, apply freeform optics, and provide CAD, AI solutions, and manufacturability checks.
Laser dicing of fully processed glass wafers into dies for e.g. micro-optical devices can be provided as a service for early development. For scaling of manufacturing, fully automated process solutions can be offered for many different applications.
CEA-Leti offers a wafer-scale micro-lens array prototype made from silicon (Si) and silicon dioxide (SiO₂), utilizing dry and wet etching with lithography. The array is customized to client specifications, enabling microlenses as small as 2 μm with no gaps. The lens arrays can span a full wafer (200 mm Si) or smaller areas as needed, with guaranteed uniformity across the surface. Applications span various markets, including AR/VR, automotive, consumer electronics, healthcare, and imaging. The technology accommodates lens diameters from 2 μm up to 100 μm, with a concave shape and a maximum height of 5 μm.
Focuslight provides wafer-scale microimprint solutions for automotive, healthcare, imaging, and packaging. Features include lens sizes <3 mm, arrays from 2–200 mm, and edge slopes <40°, enabling cost-effective production of complex optical components with freeform designs and high fill factors.
Focuslight provides wafer-scale etched microlenses for imaging, displays, and optics. Made from fused silica or silicon, they offer NAs of 0.09–0.6 and customizable arrays. Using reflow, photolithography, and dry etching, they ensure high precision for fiber optics, photonics, and laser systems.
Focuslight offers high-precision diffractive optical elements (DOEs) for AR/VR, imaging, lighting, and security applications. Manufactured using photolithography and dry etching, these DOEs provide up to 96% efficiency with feature sizes from 500 nm to 1 µm. They are ideal for beam shaping, spot generation, and metrology.
CEA offers wafer-scale nanoimprinting services using soft UV-NIL technology, ideal for industries like AR/VR, automotive, and healthcare. This method enables high-throughput patterning on silicon or glass wafers with features down to nanometers. Key specifications include minimum pattern widths of 45 nm, high uniformity (<1% variation), and low defectivity (<10 defects/cm²). Capabilities support 2D, 3D, and freeform shapes, allowing versatile design for custom optical applications.
We offer micro-optics including microlenses, lens arrays, diffractive optical elements (DOE)s. Our micro-optics products can enable all kinds of optical transceivers in Communication, 3D sensing & Lidar, and also serve for beam shaping in industrial & medical tools.
